Amorphous octa-silicon high frequency inverter

4 FAQs about [Amorphous octa-silicon high frequency inverter]

Can a silicon carbide substrate enhance amorphous indium tin oxide?

Here we show that the electrical and thermal transport properties of amorphous indium tin oxide can be enhanced using a silicon carbide substrate. Using this approach, we create top-gate transistors that have a channel length of 120 nm and exhibit negligible performance degradation under high electric fields and temperatures of up to 125 °C.

What are amorphous oxide semiconductors?

Amorphous oxide semiconductors (AOSs) are of potential use in the development of back-end-of-line-compatible electronics such as logic 1, 2, dynamic random-access memory 3, 4, 5, 6, 7 and radio-frequency (RF) 8, 9, 10 devices due to their excellent electrical properties at a low thermal budget.

Can amorphous oxide semiconductors be used as thin channel materials?

Amorphous oxide semiconductors could be used as thin channel materials in future back-end-of-line-compatible electronics. However, thin body amorphous materials suffer from Joule heating due to the strong scattering of electrons and phonons from extensive local disorder, which can lead to device failure in high-speed power-intensive applications.

How amorphous indium tin oxide can be enhanced?

The electrical and thermal transport properties of amorphous indium tin oxide can be enhanced by using a silicon carbide substrate, leading to indium tin oxide power amplifiers with an output power density of 0.69 W mm−1 and a power-added efficiency of 24.1% at 12 GHz.

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